New York Begins Installation of Key EUV Lithography Tool

Governor Hochul announces major investment in next-gen chip manufacturing at Albany Nanotech Complex.

Apr. 9, 2026 at 9:10pm

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A highly detailed, glowing 3D illustration of an advanced EUV lithography machine, its internal components illuminated by neon cyan and magenta lights, conceptually representing the cutting-edge technology powering the next generation of semiconductor manufacturing.New York's strategic investment in a state-of-the-art EUV lithography center will bolster the state's leadership in semiconductor innovation.NYC Today

New York Governor Kathy Hochul announced that NY Creates, the state's public-private partnership for semiconductor R&D, has begun installing the first major tool for a new High NA EUV Lithography Center at the Albany Nanotech Complex. This investment will help solidify New York's position as a national leader in advanced chip manufacturing and innovation.

Why it matters

The High NA EUV Lithography Center will enable New York to stay at the forefront of semiconductor technology, a critical industry for economic growth and technological progress. This new facility will support the development of next-generation computer chips needed for emerging applications like artificial intelligence, quantum computing, and advanced electronics.

The details

The new High NA EUV Lithography Center at the Albany Nanotech Complex will house specialized equipment for manufacturing cutting-edge computer chips using extreme ultraviolet (EUV) lithography, a key enabling technology for the semiconductor industry's continued scaling of transistor sizes. This first major tool installation marks a significant milestone in establishing the center's capabilities.

  • The installation of the first tool for the High NA EUV Lithography Center began in April 2026.

The players

NY Creates

New York's public-private partnership focused on semiconductor research and development.

Albany Nanotech Complex

A research and development hub for advanced semiconductor manufacturing located in Albany, New York.

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What they’re saying

“New York State is leading the nation in semiconductor manufacturing and R&D, and the installation of this tool for the High NA EUV Lithography Center will allow New York to remain at the forefront of chip innovation.”

— Governor Kathy Hochul

What’s next

The High NA EUV Lithography Center is expected to be fully operational by the end of 2027, providing New York-based semiconductor companies and researchers access to the latest manufacturing capabilities.

The takeaway

New York's strategic investment in advanced semiconductor R&D infrastructure, like the new High NA EUV Lithography Center, solidifies the state's position as a national hub for cutting-edge chip innovation and production.