Cornell Researchers Detect Atomic-Scale Defects in Computer Chips

New imaging method could improve performance and debugging of modern electronics

Published on Mar. 2, 2026

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Cornell researchers have used high-resolution 3D imaging to detect, for the first time, the atomic-scale defects in computer chips that can sabotage their performance. The imaging method, developed in collaboration with TSMC and ASM, could impact almost every form of modern electronics, from phones and automobiles to AI data centers and quantum computing.

Why it matters

Tiny defects have been a long-standing challenge for the semiconductor industry, especially as technology has grown increasingly complex while components have shrunk to the atomic scale. This new imaging capability could help engineers better understand and address these defects, leading to improved performance and reliability of modern electronics.

The details

The researchers used electron ptychography, a computational imaging method, to collect detailed scattering patterns of electrons passing through transistors. By comparing how these patterns change, they were able to reconstruct images showing the position of individual atoms and detect interface roughness, or "mouse bites", in the transistor channels. These defects form during the optimized growth process and can slow down the flow of electrons.

  • The research was published on February 23, 2026 in Nature Communications.
  • From 1997 to 2003, lead researcher David Muller worked at Bell Labs, where transistors were invented, exploring the physical limits of transistor size.

The players

David Muller

The Samuel B. Eckert Professor of Engineering in the Cornell Duffield College of Engineering, who led the project. He has unique insight into semiconductor design from his previous work at Bell Labs.

Shake Karapetyan

The doctoral student who is the lead author on the research paper.

Glen Wilk

A former colleague of Muller's at Bell Labs who is now the vice president of technology at ASM.

Taiwan Semiconductor Manufacturing Company (TSMC)

The semiconductor company that collaborated with Cornell on this research.

Advanced Semiconductor Materials (ASM)

The semiconductor materials company that collaborated with Cornell on this research.

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What they’re saying

“Since there's really no other way you can see the atomic structure of these defects, this is going to be a really important characterization tool for debugging and fault-finding in computer chips, especially at the development stage.”

— David Muller, Samuel B. Eckert Professor of Engineering (Mirage News)

“These days, a transistor channel can be only about 15 to 18 atoms wide, which is super, super tiny, and they're extremely intricate. At this point, it matters where every atom is, and it's really hard to characterize.”

— Shake Karapetyan, Doctoral student (Mirage News)

“Back then, it was like flying biplanes. And now you've got jets.”

— David Muller (Mirage News)

What’s next

The researchers plan to continue using the electron ptychography imaging method to further study and debug defects in modern computer chips, with the goal of improving the performance and reliability of a wide range of electronic devices.

The takeaway

This new imaging capability represents a major advancement in the semiconductor industry's ability to detect and address the atomic-scale defects that can impact the performance of modern electronics. By providing an unprecedented view into the inner workings of computer chips, it could lead to significant improvements in chip design, manufacturing, and troubleshooting.